發展用於量... 測機械損耗的溫和節點懸掛系統 (Developing a Gentle Nodal Suspension system for measuring mechanical loss.)more

發展用於量測機械損耗的溫和節點懸掛系統 (Developing a Gentle Nodal Suspension system for measuring mechanical loss.)

應用於量測... 薄膜機械損耗之溫和節點懸吊系統之架設及其在低溫狀態下之溫度測試 (Establishment of a Gentle Nodal Suspension System for Measuring Mechanical Loss of Thin Films and Its Temperature Test in Low Temperature Conditions)more

應用於量測薄膜機械損耗之溫和節點懸吊系統之架設及其在低溫狀態下之溫度測試 (Establishment of a Gentle Nodal Suspension System for Measuring Mechanical Loss of Thin Films and Its Temperature Test in Low Temperature Conditions)

以低壓化學... 氣相沉積法鍍製氮氧化矽薄膜並探討其光學特性 (Study of the optical properties of silicon oxynitride thin films fabricated by low pressure chemical vapor deposition)more

以低壓化學氣相沉積法鍍製氮氧化矽薄膜並探討其光學特性 (Study of the optical properties of silicon oxynitride thin films fabricated by low pressure chemical vapor deposition)

使用 LP... CVD 方法沉積 SiN 在矽懸臂基板量測其機械損耗，並開發用於量測機械損耗的 GNS (Measurements of mechanical loss in SiN deposited on a cantilever using the low-pressure chemical vapor deposition (LPCVD) method and developing a Gentle Nodal Suspension (GNS) for measuring mechanical loss.)more

使用 LPCVD 方法沉積 SiN 在矽懸臂基板量測其機械損耗，並開發用於量測機械損耗的 GNS (Measurements of mechanical loss in SiN deposited on a cantilever using the low-pressure chemical vapor deposition (LPCVD) method and developing a Gentle Nodal Suspension (GNS) for measuring mechanical loss.)

利用低壓化... 學氣相沉積法鍍製氮化矽薄膜探討其退火後之光學特性 (Study of the optical properties of silicon nitride thin films fabricated by low pressure chemical vapor deposition and subjected to thermal annealing)more

利用低壓化學氣相沉積法鍍製氮化矽薄膜探討其退火後之光學特性 (Study of the optical properties of silicon nitride thin films fabricated by low pressure chemical vapor deposition and subjected to thermal annealing)

以補氫退火... 方式降低以電漿輔助化學氣相沉積法鍍製之高含氮量氮氧化矽薄膜光學特性與機械特性之研究 (Using the hydrogen annealing to reduce optical absorption and mechanical loss of the nitride-like Silicon oxynitride thin films fabricated by plasma enhanced chemical vapor deposition)more

以補氫退火方式降低以電漿輔助化學氣相沉積法鍍製之高含氮量氮氧化矽薄膜光學特性與機械特性之研究 (Using the hydrogen annealing to reduce optical absorption and mechanical loss of the nitride-like Silicon oxynitride thin films fabricated by plasma enhanced chemical vapor deposition)

評估氮化矽... (SiNx )/氮氧化矽(SiOxNy)堆疊膜應用於雷射干涉重力波偵測器反射鏡之熱擾動效應與LPCVD-SiOxNy薄膜製程設計之研究 (Evaluation the thermal noise of the silicon nitride (SiNx)/ silicon oxynitride (SiOxNy) stacks for mirror coating of laser interferometer gravitational wave detectors and LPCVD-SiOxNy thin film process design)more

評估氮化矽(SiNx )/氮氧化矽(SiOxNy)堆疊膜應用於雷射干涉重力波偵測器反射鏡之熱擾動效應與LPCVD-SiOxNy薄膜製程設計之研究 (Evaluation the thermal noise of the silicon nitride (SiNx)/ silicon oxynitride (SiOxNy) stacks for mirror coating of laser interferometer gravitational wave detectors and LPCVD-SiOxNy thin film process design)

熱退火對電... 漿輔助化學氣相沉積法鍍製之高含氧量氮氧化矽薄膜其光學特性與機械特性影響之探討 (Annealing effect on optical and mechanical properties of the silica-like Silicon oxynitride thin films fabricated by plasma enhanced chemical vapor deposition)more

熱退火對電漿輔助化學氣相沉積法鍍製之高含氧量氮氧化矽薄膜其光學特性與機械特性影響之探討 (Annealing effect on optical and mechanical properties of the silica-like Silicon oxynitride thin films fabricated by plasma enhanced chemical vapor deposition)

應用於寬帶... 雷射重力波探測器之雙吊帶結構微型光機械諧振器之品質係數提升研究 (Study of Quality Factor Improvement of a Structural Dual-stripe Micro Opto-mechanical Resonator for Application in the Broadband Laser Interferometer Gravitational Wave Detector)more

應用於寬帶雷射重力波探測器之雙吊帶結構微型光機械諧振器之品質係數提升研究 (Study of Quality Factor Improvement of a Structural Dual-stripe Micro Opto-mechanical Resonator for Application in the Broadband Laser Interferometer Gravitational Wave Detector)

利用電漿輔... 助化學氣相沉積法鍍製氮化矽與氮氧化矽薄膜建構光學吸收經驗公式 (Study of silicon nitride and silicon oxynitride films fabricated by the plasma enhanced chemical vapor deposition method to derive empirical equation of optical absorption)more

利用電漿輔助化學氣相沉積法鍍製氮化矽與氮氧化矽薄膜建構光學吸收經驗公式 (Study of silicon nitride and silicon oxynitride films fabricated by the plasma enhanced chemical vapor deposition method to derive empirical equation of optical absorption)

利用電漿輔... 助化學氣相沉積法鍍製四分之一光學厚度氮氧化矽與氮化矽堆疊膜應用於雷射干涉重力波偵測器反射鏡之研究 (Study of silicon oxynitride and silicon nitride quarter-wave stack fabricated by a plasma enhanced chemical vapor deposition method for mirror coating of laser interferometer gravitational wave detectors)more

利用電漿輔助化學氣相沉積法鍍製四分之一光學厚度氮氧化矽與氮化矽堆疊膜應用於雷射干涉重力波偵測器反射鏡之研究 (Study of silicon oxynitride and silicon nitride quarter-wave stack fabricated by a plasma enhanced chemical vapor deposition method for mirror coating of laser interferometer gravitational wave detectors)

探討基板加... 熱對離子束濺鍍法鍍製之氮氧化矽薄膜光學特性之影響 (Investigating the effect of substrate heating on optical properties of silicon oxynitride films deposited by ion beam sputter)more

探討基板加熱對離子束濺鍍法鍍製之氮氧化矽薄膜光學特性之影響 (Investigating the effect of substrate heating on optical properties of silicon oxynitride films deposited by ion beam sputter)

利用離子束... 濺鍍法及基板加熱系統鍍製氮化矽薄膜及其材料特性 (Study of the properties of the silicon nitride thin films deposited by ion beam sputter method with substrate heating)more

利用離子束濺鍍法及基板加熱系統鍍製氮化矽薄膜及其材料特性 (Study of the properties of the silicon nitride thin films deposited by ion beam sputter method with substrate heating)

以低壓化學... 氣相沉積法鍍製之氮化矽薄膜在雷射重力波偵測器反射鏡應用之研究 (Study of the material properties of silicon nitride thin films fabricated by low pressure chemical vapor deposition for mirror coatings of the laser interferometer gravitational waves detector)more

以低壓化學氣相沉積法鍍製之氮化矽薄膜在雷射重力波偵測器反射鏡應用之研究 (Study of the material properties of silicon nitride thin films fabricated by low pressure chemical vapor deposition for mirror coatings of the laser interferometer gravitational waves detector)

降低以電漿... 輔助化學氣相沉積法鍍製之氮氧化矽薄膜光學吸收之研究 (Study the reduction of optical absorption of the oxynitride thin film fabricated by plasma enhanced chemical vapor deposition)more

降低以電漿輔助化學氣相沉積法鍍製之氮氧化矽薄膜光學吸收之研究 (Study the reduction of optical absorption of the oxynitride thin film fabricated by plasma enhanced chemical vapor deposition)

用於寬帶雷... 射干涉儀重力波探測器之新型雙吊帶結構微諧振器設計與製作 (Study of design and fabrication of a novel structural dual-stripe micro-resonator towards broadband laser interferometer gravitational waves detector)more

用於寬帶雷射干涉儀重力波探測器之新型雙吊帶結構微諧振器設計與製作 (Study of design and fabrication of a novel structural dual-stripe micro-resonator towards broadband laser interferometer gravitational waves detector)

以離子束濺... 鍍法鍍製氮氧化矽薄膜探討其光學特性 (Study on the optical properties of silicon oxynitride films deposited by ion beam sputter)more

以離子束濺鍍法鍍製氮氧化矽薄膜探討其光學特性 (Study on the optical properties of silicon oxynitride films deposited by ion beam sputter)

以離子束濺... 鍍法鍍製氮化矽薄膜其光學特性之探討 (Study of the optical properties of the silicon nitride thin films deposited by the ion beam sputter method)more

以離子束濺鍍法鍍製氮化矽薄膜其光學特性之探討 (Study of the optical properties of the silicon nitride thin films deposited by the ion beam sputter method)

以電漿輔助... 化學氣相沉積法鍍製氮氧化矽薄膜其光學特性與機械特性之探討 (Study of the optical and mechanical properties of silicon oxynitride thin films fabricated by plasma enhanced chemical vapor deposition)more

以電漿輔助化學氣相沉積法鍍製氮氧化矽薄膜其光學特性與機械特性之探討 (Study of the optical and mechanical properties of silicon oxynitride thin films fabricated by plasma enhanced chemical vapor deposition)

以電漿輔助... 化學氣相沉積法鍍製之氮化矽薄膜其熱退火後光學特性以及無氨氣製程其光學及機械特性之探討 (Study of the optical and mechanical loss properties of the silicon nitride thin films fabricated by the PECVD method and subjected to thermal annealing and NH3-free process)more

以電漿輔助化學氣相沉積法鍍製之氮化矽薄膜其熱退火後光學特性以及無氨氣製程其光學及機械特性之探討 (Study of the optical and mechanical loss properties of the silicon nitride thin films fabricated by the PECVD method and subjected to thermal annealing and NH3-free process)

以離子束濺... 鍍法鍍製奈米多層膜其光學特性之退火效應與離子束濺鍍法鍍製氮化矽薄膜之材料特性分析 (Anneal effect on optical properties of nano-layer coating deposited by ion beam sputtering and material properties of silicon nitride coatings deposited by ion beam sputtering)more

以離子束濺鍍法鍍製奈米多層膜其光學特性之退火效應與離子束濺鍍法鍍製氮化矽薄膜之材料特性分析 (Anneal effect on optical properties of nano-layer coating deposited by ion beam sputtering and material properties of silicon nitride coatings deposited by ion beam sputtering)

利用離子束... 濺鍍法鍍製二氧化矽與二氧化鈦之奈米多層薄膜應用於雷射干涉重力波偵測器反射鏡之研究 (Study on nano-layers of titania and silica deposited by ion beam sputtering for mirror coatings of laser interferometer gravitational wave detector)more

利用離子束濺鍍法鍍製二氧化矽與二氧化鈦之奈米多層薄膜應用於雷射干涉重力波偵測器反射鏡之研究 (Study on nano-layers of titania and silica deposited by ion beam sputtering for mirror coatings of laser interferometer gravitational wave detector)

利用離子束... 濺鍍法鍍製奈米多層膜其低溫機械損耗抑制效應與退火效應之研究 (Suppression effect and annealing effect on cryogenic mechanical loss of nano-layer coatings deposited by ion beam sputtering)more

利用離子束濺鍍法鍍製奈米多層膜其低溫機械損耗抑制效應與退火效應之研究 (Suppression effect and annealing effect on cryogenic mechanical loss of nano-layer coatings deposited by ion beam sputtering)

以氮化矽薄... 膜懸吊高反射鏡製作cat-flap光機械共振腔-應用於提升重力波偵測器靈敏度 (Fabrication of cat-flap optical resonator by using SiN films to hang the high reflective mirror for improving the sensitivity of Laser Interference Gravitational Waves Detector)more

以氮化矽薄膜懸吊高反射鏡製作cat-flap光機械共振腔-應用於提升重力波偵測器靈敏度 (Fabrication of cat-flap optical resonator by using SiN films to hang the high reflective mirror for improving the sensitivity of Laser Interference Gravitational Waves Detector)

以電漿輔助... 化學氣相沉積法鍍製之低氮氮化矽薄膜經熱退火後光學特性及室溫機械損耗之研究 (Study of annealing effect on the optical properties and the room temperature mechanical loss of the silicon-rich silicon nitride films deposited with PECVD)more

以電漿輔助化學氣相沉積法鍍製之低氮氮化矽薄膜經熱退火後光學特性及室溫機械損耗之研究 (Study of annealing effect on the optical properties and the room temperature mechanical loss of the silicon-rich silicon nitride films deposited with PECVD)

以電漿輔助... 化學氣相沉積法鍍製高氮氮化矽薄膜其熱退火對光學特性與機械特性之影響 (Annealing effect on the optical and mechanical properties of nitrogen-rich silicon nitride film fabricated by plasma enhance chemical vapor deposition)more

以電漿輔助化學氣相沉積法鍍製高氮氮化矽薄膜其熱退火對光學特性與機械特性之影響 (Annealing effect on the optical and mechanical properties of nitrogen-rich silicon nitride film fabricated by plasma enhance chemical vapor deposition)

應用於改善... 雷射干涉重力波偵測器靈敏度之以氫氧化鉀蝕刻製程製作之Cat-flap共振腔 (Fabrication of the Cat-Flap Resonator with KOH Etching Process for Improving the Sensitivity of Laser Interference Gravitational Waves Detector)more

應用於改善雷射干涉重力波偵測器靈敏度之以氫氧化鉀蝕刻製程製作之Cat-flap共振腔 (Fabrication of the Cat-Flap Resonator with KOH Etching Process for Improving the Sensitivity of Laser Interference Gravitational Waves Detector)

光熱共光路... 干涉儀系統之設置與電漿輔助化學氣象沉積法沉積之氮化矽薄膜光學吸收研究 (Photothermal common-path interferometry system setup and study of the optical absorption of the silicon nitride films deposited by PECVD method)more

光熱共光路干涉儀系統之設置與電漿輔助化學氣象沉積法沉積之氮化矽薄膜光學吸收研究 (Photothermal common-path interferometry system setup and study of the optical absorption of the silicon nitride films deposited by PECVD method)

以電漿輔助... 化學氣相沉積法沉積氮化矽薄膜及其與二氧化矽之堆疊膜之低溫機械損耗 (Cryogenic Mechanical Loss of SiNxHy and SiN0.40H0.79/SiO2 Stacks Deposited by Plasma Enhanced Chemical Vapor Deposition Method)more

以電漿輔助化學氣相沉積法沉積氮化矽薄膜及其與二氧化矽之堆疊膜之低溫機械損耗 (Cryogenic Mechanical Loss of SiNxHy and SiN0.40H0.79/SiO2 Stacks Deposited by Plasma Enhanced Chemical Vapor Deposition Method)

以電漿輔助... 化學氣相沉積法鍍製於矽懸臂之氮化矽其熱退火後對於室溫機械損耗之影響 (Annealing effect on the room temperature mechanical loss of the silicon nitride films deposited with PECVD on silicon cantilever)more

以電漿輔助化學氣相沉積法鍍製於矽懸臂之氮化矽其熱退火後對於室溫機械損耗之影響 (Annealing effect on the room temperature mechanical loss of the silicon nitride films deposited with PECVD on silicon cantilever)

熱退火對離... 子束濺鍍之奈米多層膜室溫與低溫機械損耗研究 (Annealing effect on the room temperature and cryogenic mechanical loss of ion beam sputtered nano-layer coatings)more

熱退火對離子束濺鍍之奈米多層膜室溫與低溫機械損耗研究 (Annealing effect on the room temperature and cryogenic mechanical loss of ion beam sputtered nano-layer coatings)

以氫氧化鉀... 蝕刻製程製作之Cat-flap共振腔 (Fabrication of Cat-Flap Resonator with KOH Etching Process)more

以氫氧化鉀蝕刻製程製作之Cat-flap共振腔 (Fabrication of Cat-Flap Resonator with KOH Etching Process)

利用電漿輔... 助化學氣相沉積法鍍製四分之一波長厚度SiN0.40/SiO2堆疊之室溫機械損耗 (Room Temperature Mechanical Loss of SiN0.40/SiO2 Quarter-wave Stacks Deposited by Plasma Enhanced Chemical Vapor Deposition Method)more

利用電漿輔助化學氣相沉積法鍍製四分之一波長厚度SiN0.40/SiO2堆疊之室溫機械損耗 (Room Temperature Mechanical Loss of SiN0.40/SiO2 Quarter-wave Stacks Deposited by Plasma Enhanced Chemical Vapor Deposition Method)

雙面鍍製於... 矽懸臂之高應力氮化矽薄膜之應力與機械損耗研究 (Stress and mechanical loss study for the double-side coated SiNx films on silicon cantilever)more

雙面鍍製於矽懸臂之高應力氮化矽薄膜之應力與機械損耗研究 (Stress and mechanical loss study for the double-side coated SiNx films on silicon cantilever)

低溫機械損... 耗量測系統之設置與熱退火對奈米多層膜機械損耗之研究 (Cryogenic mechanical loss measurement system setup and annealing effect on the mechanical loss of the nano-layer coatings)more

低溫機械損耗量測系統之設置與熱退火對奈米多層膜機械損耗之研究 (Cryogenic mechanical loss measurement system setup and annealing effect on the mechanical loss of the nano-layer coatings)

利用電漿輔... 助化學氣相沉積法沉積之非晶矽與二氧化矽薄膜其光學與機械性質之研究 (Study of the optical-mechanical properties of amorphous silicon and silicon dioxide fabricated by Plasma Enhance Chemical Vapor Deposition (PECVD))more

利用電漿輔助化學氣相沉積法沉積之非晶矽與二氧化矽薄膜其光學與機械性質之研究 (Study of the optical-mechanical properties of amorphous silicon and silicon dioxide fabricated by Plasma Enhance Chemical Vapor Deposition (PECVD))

奈米多層薄... 膜在熱退火後的晶粒尺寸研究 (Study of the crystallite size for the nano-meter multilayer stack after thermal anneal)more

奈米多層薄膜在熱退火後的晶粒尺寸研究 (Study of the crystallite size for the nano-meter multilayer stack after thermal anneal)

以電漿輔助... 化學氣相沈積法於矽懸臂沈積之氮化矽薄膜應力對機械損耗之影響暨機械損耗量測系統改善 (Stress effect on mechanical loss of the SiNx film deposited with PECVD method on silicon cantilever and setup for the loss measurement improvement)more

以電漿輔助化學氣相沈積法於矽懸臂沈積之氮化矽薄膜應力對機械損耗之影響暨機械損耗量測系統改善 (Stress effect on mechanical loss of the SiNx film deposited with PECVD method on silicon cantilever and setup for the loss measurement improvement)

探討應用於... 雷射干涉重力波偵測器之以電漿輔助化學氣相沈積法製備於矽懸臂之氮化矽薄膜之材料特性與機械損耗 (Study of the material properties and the mechanical loss of the silicon nitride films deposited by PECVD method on silicon cantilever for laser interference gravitational wave detector application)more

探討應用於雷射干涉重力波偵測器之以電漿輔助化學氣相沈積法製備於矽懸臂之氮化矽薄膜之材料特性與機械損耗 (Study of the material properties and the mechanical loss of the silicon nitride films deposited by PECVD method on silicon cantilever for laser interference gravitational wave detector application)

應用於雷射... 干涉重力波偵測器之以離子束濺鍍法製作之奈米膜層結構高反射鏡及其結晶條件之探討 (Fabrication and annealing study of the ion beam sputtered nano-layer structures in the high reflective dielectric mirror for the laser interference gravitational wave)more

應用於雷射干涉重力波偵測器之以離子束濺鍍法製作之奈米膜層結構高反射鏡及其結晶條件之探討 (Fabrication and annealing study of the ion beam sputtered nano-layer structures in the high reflective dielectric mirror for the laser interference gravitational wave)