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| 畢業學年度 | 論文標題 | 連結 | 學位 | 畢業時長(years) |
|---|---|---|---|---|
| 關鍵字 | ||||
| 112 | 基板偏壓對... 基板偏壓對高功率脈衝磁控濺鍍製備氮化釩薄膜氧化行為之影響 (Effect of Substrate Bias on Oxidation Behavior of VN Coatings Deposited by High Power Impulse Magnetron Sputtering) | NTHU NDLTD | 碩 | 1.98 |
氮化釩薄膜(Vanadium nitride coating)、高功率脈衝磁控濺鍍(HiPIMS)、基板偏壓(Substrate bias)、氧化行為(Oxidation behavior)、熱重分析(TGA) 氮化釩薄膜... | ||||
| 112 | 氮流量和製... 氮流量和製程溫度對高功率脈衝磁控濺射製備之氮化釩鉬薄膜結構及性質的影響 (Effects of Nitrogen Flow Rate and Deposition Temperature on the Structure and Properties of VMoN Thin Films Deposited by High Power Impulse Magnetron Sputtering) | NTHU NDLTD | 碩 | 1.98 |
高功率脈衝磁控濺射(High power impulse magnetron sputtering)、氮化釩鉬(VMoN)、氮流量(vanadium molybdenum nitride)、製程溫度(Nitrogen flow rate)、過渡金屬氮化物薄膜(Deposition temperature) 高功率脈衝... | ||||
| 112 | 氮氣流量與... 氮氣流量與功率對中空陰極離子鍍著系統製備氮化鈦薄膜微結構和性質之影響 (Effects of Nitrogen Flow Rate and Gun Power on the Microstructure and Properties of TiN Thin Film Deposited by HCD-IP Method) | NTHU NDLTD | 碩 | 1.98 |
氮化鈦(TiN)、中空陰極離子鍍著系統(HCD-IP)、氮氣流量(Nitrogen flow rate)、過渡金屬氮化物薄膜(Gun power) 氮化鈦(T... | ||||
| 112 | 高功率脈衝... 高功率脈衝磁控濺鍍製備氮化鉬薄膜之破裂韌性及氮化鉬/鈦雙層薄膜之應力量測 (Measurements of Fracture Toughness of γ-Mo2N and Residual Stress of γ-Mo2N/Ti Bilayer Coatings by High Power Impulse Magnetron Sputtering) | NTHU NDLTD | 碩 | 1.98 |
氮化鉬(Molybdenum nitride)、高功率脈衝磁控濺鍍(HiPIMS)、破裂韌性(Fracture toughness)、金屬介層(Metal interlayer)、殘餘應力(Residual stress) 氮化鉬(M... | ||||
| 112 | 磁控濺鍍製... 磁控濺鍍製備氮化釩鉬薄膜之結構與性質研究 (Synthesis and characterization of (V,Mo)N coatings deposited by magnetron sputtering) | NTHU NDLTD | 博 | 6.32 |
氮化釩鉬薄膜(Vanadium molybdenum nitride)、氮流量(Nitrogen flow rate)、磁控濺鍍(Magnetron sputtering)、破裂韌性(Fracture toughness)、摩擦學性質(Tribological properties) 氮化釩鉬薄... | ||||
| 111 | 氮流量對氮... 氮流量對氮化鉬鍍層之高溫磨潤性及氧化行為影響研究 (Effect of Nitrogen Flow Rate on Elevated Temperature Tribological Properties and Oxidation Behavior of Molybdenum Nitride Coatings) | NTHU NDLTD | 碩 | 1.97 |
氮化鉬鍍層(Molybdenum nitride coating)、氮流量(Nitrogen flow rate)、高功率脈衝磁控濺鍍(HPPMS)、高溫磨潤性(Elevated temperature tribological properties)、氧化行為(Oxidation behavior) 氮化鉬鍍層... | ||||
| 111 | 使用高功率... 使用高功率脈衝磁控濺鍍法於D2鋼基材製備γ-氮化鉬/鉬雙層鍍層中鉬金屬介層之功能 (Function of Mo Metal Interlayer in γ-Mo2N/Mo Bilayer Coatings on D2 Steel Deposited by High Power Pulsed Magnetron Sputtering) | NTHU NDLTD | 碩 | 1.97 |
氮化鉬(Molybdenum nitride)、高功率脈衝磁控濺鍍(HPPMS)、金屬介層(Metal interlayer)、殘餘應力(Residual stress)、耐磨性(Wear resistance) 氮化鉬(M... | ||||
| 111 | 利用高功率... 利用高功率脈衝磁控濺鍍製備之氮化釩鉬薄膜氧化行為研究 (The Oxidation Behavior of VMoN Thin Films Deposited by High Power Pulsed Magnetron Sputtering) | NTHU NDLTD | 碩 | 1.97 |
氮化釩鉬(Vanadium molybdenum nitride)、高功率脈衝磁控濺鍍(HPPMS)、氧化行為(Oxidation behavior)、熱重分析法(Thermal gravimetric analysis)、佔空比(Duty cycle) 氮化釩鉬(... | ||||
| 110 | 佔空比及工... 佔空比及工作氣壓對高功率脈衝與非平衡磁控共濺鍍於D2鋼基材之氮化鈦鋯鍍層結構和機械性質的影響 (Effects of Duty Cycle and Working Pressure on Structure and Mechanical Properties of TiZrN Coatings on D2 Steel by Co-sputtering HPPMS/UBMS) | NTHU NDLTD | 碩 | 1.98 |
氮化鈦鋯(TiZrN)、高功率脈衝磁控濺鍍(HPPMS)、佔空比(Duty cycle)、工作氣壓(working pressure)、機械性質(mechanical properties) 氮化鈦鋯(... | ||||
| 110 | 鍍膜能量與... 鍍膜能量與氧流量變化對於氮氧化鋯薄膜鍍著於鎳基超合金Haynes 282磨潤性影響之研究 (Study on the Effect of Coating Energy and Oxygen Flow Rate Variation on the Tribological Behavior of ZrNxOy Thin Films Coated With Nickel-based Superalloy Haynes 282) | NTHU NDLTD | 碩 | 1.98 |
磨潤性(Tribological Behavior)、氮氧化鋯薄膜(ZrNxOy Thin Films)、鎳基超合金(Nickel-based Superalloy)、中空陰極離子鍍(Hollow cathode ion plating)、氧流量(Oxygen flow rate)、鍍膜能量(Coating energy) 磨潤性(T... | ||||
| 110 | 純鎳初始微... 純鎳初始微結構對於毫秒級脈衝雷射局部熱處理的適用功率之影響 (Effect of Initial Microstructure on Localized Heat Treatment of Nickel Sheets by Millisecond Pulse Laser) | NTHU NDLTD | 碩 | 1.98 |
雷射處理(Laser treatment)、純鎳(Pure nickel)、局部熱處理(Localized Heat Treatment)、紅外線測溫儀(Thermographic camera)、放射率(Emissivity) 雷射處理(... | ||||
| 110 | 佔空比對高... 佔空比對高功率脈衝磁控濺鍍製備之氮化鈦覆蓋氮化釩鍍層機械性質之影響 (Effect of Duty Cycle on Mechanical Properties of TiN-capped VN Coatings Deposited by High Power Pulsed Magnetron Sputtering) | NTHU NDLTD | 碩 | 1.97 |
氮化釩(Vanadium nitride)、氮化鈦(Titanium nitride)、高功率脈衝磁控濺鍍(HPPMS)、佔空比(Duty cycle)、耐磨性(Wear resistance)、循環功率誘發疲勞(Power-cycle induced fatigue (PCIF)) 氮化釩(V... | ||||
| 110 | 佔空比與工... 佔空比與工作壓力對高功率脈衝磁控濺鍍製備氮化鉬鍍層結構與機械性質之影響 (Effects of Duty Cycle and Working Pressure on Structure and Mechanical Properties of Molybdenum Nitride Coatings Deposited by High Power Pulsed Magnetron Sputtering) | NTHU NDLTD | 碩 | 1.97 |
氮化鉬(Molybdenum nitride)、高功率脈衝磁控濺鍍(HPPMS)、織構(Texture)、殘留應力(Residual stress)、耐磨性(Wear resistance)、週次功率誘發疲勞(power cycle-induced fatigue (PCIF)) 氮化鉬(M... | ||||
| 109 | 鍍著於鎳基... 鍍著於鎳基超合金Haynes 282之熱處理氮化鋯薄膜抗蝕性提升研究 (A Study on the Enhancement of Corrosion Resistance of Vacuum Annealed ZrN Thin Films on Ni-based Superalloy Haynes 282) | NTHU NDLTD | 碩 | 2.07 |
氮化鋯(Zirconium Nitride)、真空熱處理(heat treatment)、防蝕性(corrosion resistance)、鎳機超合金(Ni-based superalloy) 氮化鋯(Z... | ||||
| 109 | 800 到... 800 到 950°C下空氣中的鎳基超合金Haynes 282之氧化動力學與氧化層表面殘餘應力分析 (Oxidation Kinetics and Residual Stress of Scales of a Ni-based Superalloy Haynes 282 in Dry Air at 800-950°C) | NTHU NDLTD | 碩 | 2.05 |
鎳基超合金(Nickel-based superalloy)、Haynes 282(Haynes 282)、高溫氧化(High temperature oxidation)、氧化層厚度(Thickness of oxide layer)、殘餘應力(Residual stress) 鎳基超合金... | ||||
| 109 | 利用能量平... 利用能量平衡模式研究氮化鈦/鈦雙層薄膜之應力釋放機制 (Study of stress relief mechanism in TiN/Ti bilayer thin film using energy balance model) | NTHU NDLTD | 碩 | 1.98 |
氮化鈦薄膜(TiN)、鈦介層(Ti interlayer)、殘留應力(Residual stress)、應力釋放(Stress relief)、彈性儲存能(Stored energy) 氮化鈦薄膜... | ||||
| 109 | 佔空比及工... 佔空比及工作氣壓對高功率脈衝與非平衡磁控共濺鍍製備氮化鈦鋯鍍層結構和性質的影響 (Effects of Duty Cycle and Working Pressure on Structure and Properties of TiZrN Coatings by Co-sputtering HiPIMS/UBMS) | NTHU NDLTD | 碩 | 1.98 |
氮化鈦鋯(TiZrN)、高功率脈衝與非平衡磁控共濺鍍(Hybrid HiPIMS/DCMS)、佔空比(Duty cycle)、工作氣壓(Working pressure)、殘留應力(Residual stress) 氮化鈦鋯(... | ||||
| 109 | 製程參數對... 製程參數對高功率脈衝磁控濺鍍製備氮化鉬薄膜結構與性質之影響 (Effects of Process Parameters on Structure and Properties of Molybdenum Nitride Thin Films by High-Power Impulse Magnetron Sputtering) | NTHU NDLTD | 碩 | 1.98 |
氮化鉬(Molybdenum nitride)、高功率脈衝磁控濺鍍(High-power impulse magnetron sputtering)、織構(Texture)、殘留應力(Residual stress) 氮化鉬(M... | ||||
| 108 | 金屬介層之... 金屬介層之設計對氮化鈦鋯雙層鍍層應力釋放之影響 (Effect of Metal Interlayer Design on Stress Relief in TiZrN Bi-layered Coatings) | NTHU NDLTD | 碩(提早入學) | 2.47 |
金屬介層(Metal interlayer)、應力釋放(Stress relief)、雙層鍍層(Bi-layered coatings)、塑性變形(Plastic deformation)、儲存能釋放(Stored energy relief)、有效變形厚度(Effective deformation thickness) 金屬介層(... | ||||
| 108 | 鍍層架構對... 鍍層架構對鍍覆於矽基板之氮化鈦鋯鍍層殘留應力釋放機制之影響 (Effect of Coating Architecture on Stress Relief Mechanism of TiZrN Coating on Silicon Substrate) | NTHU NDLTD | 碩 | 1.98 |
氮化鈦鋯(TiZrN)、介層(interlayer)、鍍層架構(coating architecture)、殘留應力(residual stress) 氮化鈦鋯(... | ||||
| 108 | 鍍層架構對... 鍍層架構對鍍覆於AISI D2鋼之氮化鈦鋯鍍層磨潤性之影響 (Effect of Coating Architecture on Tribological Behavior of TiZrN Coatings on AISI D2 Steel) | NTHU NDLTD | 碩 | 1.98 |
氮化鈦鋯(TiZrN)、介層(interlayer)、過渡層(transitional layer)、殘留應力(residual stress)、磨潤性(tribological) 氮化鈦鋯(... | ||||
| 107 | 以實驗規劃... 以實驗規劃法及單因子法(氮氣流量)優化氮化鉬薄膜製程 (Optimization of the Deposition Processing of MoNx Thin Films by Design of Experiment and Single Variable (Nitrogen flow rate) Methods) | NTHU NDLTD | 碩 | 1.98 |
氮化鉬(Molybdenum nitride)、田口實驗規劃法(The Taguchi design of experiment method)、反應式濺鍍(Reactive sputtering) 氮化鉬(M... | ||||
| 107 | 氮氣流量與... 氮氣流量與基板偏壓對氮化鉬薄膜結構與性質之影響研究 (Effects of Nitrogen Flow Rate and Substrate Bias on Structure and Properties of Molybdenum Nitride Thin Films) | NTHU NDLTD | 碩 | 1.98 |
氮化鉬(Molybdenum nitride)、金屬氮化物(TMeN)、陶瓷薄膜(Ceramic thin film) 氮化鉬(M... | ||||
| 107 | 金屬梯度層... 金屬梯度層對鍍覆於AISI D2鋼之氮化鈦鋯鍍層磨潤性之影響 (Effect of Metallic Graded Layers on Tribological Behavior of TiZrN Coatings on AISI D2 steel) | NTHU NDLTD | 碩 | 1.98 |
金屬梯度層(Metallic graded layer)、氮化鈦鋯(TiZrN)、附著性(Adhesion strength)、抗磨耗性(Wear resistance)、殘留應力(Residual stress) 金屬梯度層... | ||||
| 107 | 功能性梯度... 功能性梯度層對鍍覆於 AISI D2鋼之氮化鈦鋯鍍層磨潤性之影響 (Effect of Functionally Graded Layers on Tribological Behavior of TiZrN Coatings on AISI D2 Steel) | NTHU NDLTD | 碩 | 1.98 |
氮化鈦鋯(TiZrN)、過渡層(Transitional layer)、殘留應力(Residual stress)、儲存能(Stored energy)、耐磨性(Wear resistance) 氮化鈦鋯(... | ||||
| 107 | 電磁攪拌對... 電磁攪拌對氬銲309L/347不鏽鋼銲道微結構、機械性質與腐蝕性質之影響 (Influence of Electromagnetic Stirring on Structure, Me-chanical and Corrosion Properties of 309L/347 Stain-less Steel Weldments by Gas Tungsten Arc Welding) | NTHU NDLTD | 碩 | 6.95 |
309L不鏽鋼(309L weldments)、347不鏽鋼(347 weldments)、氬銲(gas tungsten arc welding)、電磁攪拌(electromagnetic stirring) 309L不... | ||||
| 107 | 高氫含量對... 高氫含量對鋯四合金高週疲勞性質之影響 (Effect of High Hydrogen Content on High Cycle Fatigue Properties of Zircaly-4) | NTHU NDLTD | 碩 | 2.60 |
金屬材料(nuclear)、核能材料(Metal)、機械性質(hydride) 金屬材料(... | ||||
| 107 | 利用射頻磁... 利用射頻磁控濺鍍系統製備鐵酸鉍多晶薄膜之晶態與疇域結構研究 (Crystalline State and Domain Structure of Polycrystalline BiFeO3 Films Deposited by Radio-Frequency Magnetron Sputtering) | NTHU NDLTD | 碩 | 2.13 |
鐵酸鉍(BiFeO3)、薄膜(thin film)、織構(texture)、射頻磁控濺鍍(RF-sputtering) 鐵酸鉍(B... | ||||
| 106 | 鈦介層對鍍... 鈦介層對鍍覆於矽基板之氮化鋯/鈦雙層薄膜殘留應力釋放之影響 (Effect of Ti Interlayer on Stress Relief of ZrN/Ti Bilayer Thin Films on Silicon Substrate) | NTHU NDLTD | 碩 | 1.98 |
殘留應力(Residual Stress)、鈦介層(Ti Interlayer)、塑性應變(Plastic Strain)、平均X光應變(Average X-ray Strain)、氮化鋯(ZrN) 殘留應力(... | ||||
| 106 | 模板效應對... 模板效應對磁控濺鍍之氮化釩薄膜織構演變之影響 (Template Effect on Texture Evolution of VN Thin Films Deposited by Unbalanced Magnetron Sputtering) | NTHU NDLTD | 碩 | 1.98 |
氮化釩(Vanadium)、介層(Nitride)、模板(Texture)、織構(Template) 氮化釩(V... | ||||
| 106 | 以實驗規畫... 以實驗規畫法優化高功率脈衝磁控濺鍍製備之釔安定二氧化鋯薄膜製程 (Using Design of Experiment to Optimize Deposition Processing of YSZ Thin Films by High Power Impulse Magnetron Sputtering) | NTHU NDLTD | 碩 | 1.97 |
高功率脈衝磁控濺鍍(HIPIMS)、釔安定二氧化鋯(YSZ)、透明硬膜(undefined)、室溫鍍膜(undefined) 高功率脈衝... | ||||
| 105 | 應用平均 ... 應用平均 X光應變法準確量測氮化鈦硬膜之殘留應力與應力梯度 (Using Average X-ray Strain Method for the measurements of Accurate Residual Stress and Stress Gradient on TiN Hard Coatings) | NTHU NDLTD | 博 | 暫無口試日期 |
X光繞設法(XRD)、殘留應力(Residual stress)、殘留應力梯度(Residual stress gradient)、Ｘ光平均應變法(Average X-ray Strain)、氮化鈦薄膜(TiN coating) X光繞設法... | ||||
| 105 | 優選方向對... 優選方向對氮化釩硬膜破裂韌性之影響 (Effect of Preferred Orientation on the Fracture Toughness of VN Hard Coatings) | NTHU NDLTD | 碩 | 1.98 |
破裂韌性(Fracture toughness)、殘留應力(Residual stress)、氮化釩覆膜(VN coating)、累積內能誘發破裂法(Internal energy induced cracking (IEIC) method)、織構(texture) 破裂韌性(... | ||||
| 105 | 鈦介層厚度... 鈦介層厚度對鍍覆於AISI D2鋼之氮化鈦鋯薄膜機械性質與耐磨性之影響 (Effect of Ti interlayer thickness on mechanical properties and wear resistance of TiZrN coatings on AISI D2 steel) | NTHU NDLTD | 碩 | 1.98 |
介層(interlayer)、氮化鈦鋯(TiZrN)、耐磨性(wear resistance)、機械性質(mechanical properties)、介層厚度(interlayer thickness) 介層(in... | ||||
| 105 | 氧化鋯覆膜... 氧化鋯覆膜鋯四合金之初期氧化行為研究 (The Incipient Oxidation Behavior of ZrO2-Coated Zircaloy-4) | NTHU NDLTD | 碩 | 1.97 |
二氧化鋯薄膜(ZrO2 thin film)、鋯四合金(Zircaloy-4)、氧化行為(Oxidation behavior)、殘留應力(Residual stress) 二氧化鋯薄... | ||||
| 105 | 氮化釩薄膜... 氮化釩薄膜織構演變之研究 (Texture Evolution of VN Thin Films) | NTHU NDLTD | 碩 | 1.97 |
織構(Texture)、氮化釩薄膜(VNThinFilms)、非平衡磁控濺鍍(UnbalancedMagnetronSputtering) 織構(Te... | ||||
| 105 | 基板偏壓對... 基板偏壓對磁控濺鍍備製氮化釩薄膜結構與性質的影響 (Effect of Substrate bias on Structure and Properties of VN Thin Films Deposited by Unbalanced Magnetron Sputtering) | NTHU NDLTD | 碩 | 1.97 |
氮化釩(vanadium nitride)、磁控濺鍍系統(thin films)、基板偏壓(unbalanced magnetron sputtering)、薄膜(substrate bias) 氮化釩(v... | ||||
| 105 | 使用熱重分... 使用熱重分析法研究氬氣環境下Ti1-xZrxN被覆D2鋼的氧化行為 (Study of Oxidation Behavior of Ti1-xZrxN Coated D2 Steel in Ar Atmosphere using Thermal Gravimetric Analysis) | NTHU NDLTD | 碩 | 1.97 |
熱重分析(TGA)、氮化鈦鋯薄膜(TiZrN thin film)、氧化行為(oxidation)、氬氣氣氛(Ar atmosphere)、斯里蘭卡礦(srilankite) 熱重分析(... | ||||
| 104 | 利用實驗規... 利用實驗規劃法與單因子(氮氣流量)法優化氮化釩薄膜製程 (Optimization of the Deposition Processing of VN Thin Films by Design of Experiment and Single Variable (Nitrogen Flow Rate) Methods) | NTHU NDLTD | 碩 | 暫無口試日期 |
氮化釩薄膜(Vanadium nitride thin film)、田口實驗設計(Taguchi design of experiment)、製程參數(Processing parameter)、氮氣流量(Nitrogen flow rate) 氮化釩薄膜... | ||||
| 104 | 鋯介層對氮... 鋯介層對氮化鋯薄膜殘留應力之影響 (Effect of Zr Interlayer on Residual Stress of ZrN Thin Films) | NTHU NDLTD | 碩 | 暫無口試日期 |
鋯介層(Zr interlayer)、氮化鋯薄膜(ZrN thin flm)、殘留應力(residual stress)、介面破裂韌性(interfacial fracture toughness) 鋯介層(Z... | ||||
| 104 | 鈦介層對鍍... 鈦介層對鍍覆於AISI D2 鋼之氮化鈦鋯薄膜機械性質之影響 (Effect of Ti interlayer on Mechanical Properties of TiZrN Coatings on D2 Steel) | NTHU NDLTD | 碩 | 暫無口試日期 |
氮化鈦鋯(TiZrN)、鈦介層(Ti interlayer)、磨耗(Wear resistance) 氮化鈦鋯(... | ||||
| 103 | 利用X光平... 利用X光平均應變量測法結合奈米壓印法量測氮化鋯薄膜之殘餘應力 (Measurement of residual stress of ZrN thin film by using average X-ray strain method combined with nano-indentation) | NTHU NDLTD | 碩 | 暫無口試日期 |
薄膜(thin film)、X光繞射(X-ray diffraction)、殘餘應力(residual stress)、氮化鋯(ZrN) 薄膜(th... | ||||
| 103 | 氧對於氮氧... 氧對於氮氧化鋯硬膜之破裂靭性的影響 (Effect of Oxygen on the Fracture Toughness of Zr(N,O) Hard Coatings) | NTHU NDLTD | 碩 | 暫無口試日期 |
破裂韌性(fracture toughness)、氮氧化鋯(Zr(N,O))、氮化鋯(ZrN)、織構(texture)、殘餘應力(residual stress) 破裂韌性(... | ||||
| 103 | 結合平均X... 結合平均X光應變及奈米壓印法量測氮化鈦鋯薄膜之殘餘應力 (Measurement of residual stress of TiZrN thin films by combining average X-ray strain (AXS) and nanoindentation methods) | NTHU NDLTD | 碩 | 暫無口試日期 |
氮化鈦鋯(TiZrN)、殘餘應力(Residual stress)、X光繞射(X-ray diffraction) 氮化鈦鋯(... | ||||
| 103 | 真空熱處理... 真空熱處理之氮化鋯薄膜氧化行為與防蝕性之探討 (The Oxidation Behavior and Corrosion Resistance of ZrN Thin Films Annealed in Vacuum) | NTHU NDLTD | 碩 | 暫無口試日期 |
氮化鋯(zirconium nitride)、氧化鋯(zirconium oxide)、熱處理(heat treatment)、防蝕性(corrosion resistance)、氧化行為(oxidation behavior) 氮化鋯(z... | ||||
| 103 | 濺鍍於D2... 濺鍍於D2鋼上氮化鋯鍍層之機械性質研究 (Mechanical Properties of Thick ZrN Coatings on D2 Steel Deposited by Unbalanced Magnetron Sputtering) | NTHU NDLTD | 碩 | 暫無口試日期 |
鍍層(Coating)、氮化鋯(ZrN)、厚膜(Thick coating)、附著性(Adhesion)、磨耗(Wear) 鍍層(Co... | ||||
| 102 | 藉由RF磁... 藉由RF磁控濺鍍探討鐵磁層溫度變化於鐵酸鉍(BiFeO3)/鐵白金(FePt)雙層磊晶薄膜系統對交換耦合偏壓之影響 (Effect of ferromagnetic layer growth temperature on exchange bias of BiFeO3/FePt bi-layer epitaxial films) | NTHU NDLTD | 碩 | 暫無口試日期 |
薄膜(thin film)、磊晶(epitaxial)、交換耦合偏壓(Exchange bias)、鉍鐵氧(BiFeO3)、鐵白金(FePt) 薄膜(th... | ||||
| 102 | 氮化鋯薄膜... 氮化鋯薄膜經真空熱處理之氧化行為與防蝕性之研究 (The Oxidation Behavior and Corrosion Resistance of ZrN Thin Films Heat Treated in Vacuum) | NTHU NDLTD | 碩 | 暫無口試日期 |
二氧化鋯(zirconium oxide)、氮化鋯(zirconium nitride)、熱處理(heat treatment)、非平衡磁控濺鍍(unbalanced magnetron sputtering)、相變化(phase transformation) 二氧化鋯(... | ||||
| 102 | 製程參數對... 製程參數對D2鋼上濺鍍氮化鈦鍍層之磨耗與機械性質影響研究 (Effect of processing parameters on wear resistance and mechanical properties of thick TiN coatings on D2 steel deposited by unbalanced magnetron sputtering) | NTHU NDLTD | 碩 | 暫無口試日期 |
氮化鈦、微米等級、工具鋼、耐磨耗性、非平衡磁控濺鍍系統 氮化鈦、微... | ||||
| 102 | 冷加工與加... 冷加工與加氫水化學對具動態應變時效之鎳基合金於模擬沸水式反應器冷卻水環境之影響研究 (Effect of cold work on DSA behavior of Inconel 600 alloy in simulated BWR coolant environment with hydrogen water chemistry) | NTHU NDLTD | 碩 | 暫無口試日期 |
動態應變時效(Dynamic strain aging)、慢速率拉伸試驗(slow strain rate tensile test)、加氫水化學(hydrogen water chemistry)、冷作加工(cold work)、鎳基合金 600(Inconel 600) 動態應變時... | ||||
| 102 | 基板偏壓對... 基板偏壓對磁控濺鍍備製氮化鈦鋯薄膜結構與性質之影響 (Effect of Bias on the Structure and Properties of TiZrN Thin Films Deposited by Unbalanced Magnetron Sputtering) | NTHU NDLTD | 碩 | 暫無口試日期 |
氮化鈦鋯(TiZrN)、基板偏壓(Substrate bias)、硬度(Hardness)、殘餘應力(Residual stress) 氮化鈦鋯(... | ||||
| 102 | 成份對於氮... 成份對於氮化鈦鋯硬膜之破裂靭性的影響 (Effect of Composition on Fracture Toughness of Ti1-xZrxN Hard Coatings) | NTHU NDLTD | 碩 | 暫無口試日期 |
破裂靭性(Fracture toughness)、氮化鈦鋯硬膜(Ti1-xZrxN hard coating) 破裂靭性(... | ||||
| 101 | 藉由調整非... 藉由調整非平衡磁控濺鍍製程參數沉積氮化鈦厚膜 (Depositing Thick TiN Film by Adjusting Processing Parameters of Unbalanced Magnetron Sputtering) | NTHU NDLTD | 碩 | 暫無口試日期 |
氮化鈦(Titanium nitride)、厚膜(Thick coating)、非平衡磁控濺鍍(Unbalanced magnetron sputtering) 氮化鈦(T... | ||||
| 101 | 氮化鋯硬膜... 氮化鋯硬膜破裂韌性量測 (Fracture Toughness Measurement of ZrN Hard Coatings) | NTHU NDLTD | 碩 | 暫無口試日期 |
氮化鋯(Zirconium nitride)、破裂韌性(Fracture toughness)、織構(Texture)、應力梯度(Stress gradient) 氮化鋯(Z... | ||||
| 101 | 經真空熱處... 經真空熱處理之氮化鈦鋯薄膜氧化行為研究 (Oxidation Behavior of Vacuum Annealed TiZrN Thin Film) | NTHU NDLTD | 碩 | 暫無口試日期 |
氮化鈦鋯薄膜(TiZrN thin film)、磁控濺鍍(magnetron sputtering)、熱處理(heat treatment)、氧化行為(oxidation behavior) 氮化鈦鋯薄... |